Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• an alkali-soluble resin (A) having a phenolic hydroxyl group;
• a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule;
• a basic material (D);
• and
• a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• wherein the crosslinking agent (C) includes a crosslinking agent (C1) represented by the following General Formula (II):
• wherein in General Formula (II),
• each of X1 and X2 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a hydroxymethyl group, or an alkoxymethyl group, provided that at least one of two X1's is a hydroxymethyl group or an alkoxymethyl group,
• in the case where both of two X1's are a hydroxymethyl group or an alkoxymethyl group, Y1 represents a carbon atom, a nitrogen atom, or an oxygen atom, and in the case where one X1 is neither a hydroxymethyl group nor an alkoxymethyl group, Y1 is a nitrogen atom and also X2 is a hydroxymethyl group or an alkoxymethyl group,
• Y2 represents a single bond, an alkylene group, or a cycloalkylene group,
• Z2 represents an organic group,
• n is 2 when Y1 is a carbon atom, n is 1 when Y1 is a nitrogen atom, and n is 0 when Y1 is an oxygen atom, and
• any two of X1, X2, and Y2 may be bonded to each other to form a ring, and in the case where X1 and Y2 are bonded to each other, X1 and Y2 form a six-membered ring,
• the crosslinking agent (C1) has a molecular weight of 420 or more and also has two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule,
• a content of the crosslinking agent (C1) is 60 mol % to 100 mol % based on a total amount of the crosslinking agent (C), and
• a total concentration of hydroxymethyl groups or alkoxymethyl groups in the crosslinking agent (C) is 0.30 mmol/g or higher relative to 1 g of a solid content in the actinic ray-sensitive or radiation-sensitive resin composition, and
• wherein the basic material (D) is represented by the following General Formula (N-II),
• wherein in General Formula (N-II),
• A+ represents a sulfur ion or an iodine ion,
• R1 represents a hydrogen atom or an organic group, and in the case where a plurality of R1's are present, R1's may be the same or different,
• R represents an (o+1)-valent aromatic hydrocarbon group, and in the case where a plurality of R's are present, R's may be the same or different,
• X represents a single bond, a methylene group, or a carbonyloxy group, and in the case where a plurality of X's are present, X's may be the same or different,
• AN represents a basic moiety selected from an amino group or a nitrogen-containing heterocyclic group, and in the case where a plurality of AN's are present, AN's may be the same or different,
• in the case where A is a sulfur atom, n is an integer of 1 to 3, and m is an integer satisfying a relationship of m+n=3,
• in the case where A is an iodine atom, n is 1 or 2, and m is an integer satisfying a relationship of m+n=2, and
• o represents an integer of 1 to 10, Y− represents an anion, and at least two of R1, X, R, or AN may be bonded to each other to form a ring.