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US 10,120,278 B2Granted
Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasahiro Fukushima, Kazuhiro Katayama
Life of this patent
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Abstract
A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.
Claims15
A carboxylic acid onium salt having the formula (1):
- wherein R0 is hydrogen, or a C1-C20 straight, branched or cyclic monovalent hydrocarbon group which may contain a heteroatom,
- R1 and R2 are each independently hydrogen, or a C1-C20 straight, branched or cyclic monovalent hydrocarbon group which may contain a hydroxyl moiety, cyano moiety, carbonyl moiety, ether bond, ester bond, sulfonate bond, carbonate bond, lactone ring, sultone ring, or carboxylic anhydride, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached,
- Rf1 and Rf2 are each independently fluorine or a C1-C6 perfluoroalkyl group,
- LA is a single bond or forms an ester bond, sulfonate bond, carbonate bond or carbamate bond with the vicinal oxygen atom,
- Z+ is a sulfonium cation having the formula (2) or an iodonium cation having the formula (3):
- wherein R11, R12 and R13 are each independently a C1-C20 straight, branched or cyclic monovalent hydrocarbon group which may contain a heteroatom, any two of R11, R12 and R13 may bond together to form a ring with the sulfur atom in the formula, R14 and R15 are each independently a C1-C20 straight, branched or cyclic monovalent hydrocarbon group which may contain a heteroatom.
3 more elements
Dependencies are inferred from the claim text.