Radiation-sensitive composition and pattern-forming method

A radiation-sensitive composition comprising:

• particles comprising a metal oxide as a principal component;
• a radiation-sensitive acid generator selected from the group consisting of a N-sulfonyloxyimide compound, a diazo ketone compound, and a combination thereof;
• and
• an organic solvent,
• wherein:
• the metal oxide comprises at least one metal atom selected from the group consisting of a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, and a tellurium atom;
• a van der Waals volume of an acid generated from the radiation-sensitive acid generator is less than 2.0×10−28 m3;
• and
• a percentage content of the at least one metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %.