Vertical photo alignment method with maintaining position of mask unchanged and manufacture method of liquid crystal display panel utilizing the same

A manufacture method of a liquid crystal display panel utilizing a vertical photo alignment method with maintain a position of a mask unchanged, comprising steps of:

• step 10, providing a TFT substrate and a CF substrate, and the TFT substrate and the CF substrate respectively comprise a pixel region and correspond to each other;
• the pixel region is a square, and is divided into four square sub regions of equal sizes, which respectively are a first sub region, a second sub region, a third sub region and a fourth sub region sequentially aligned clockwise or counter clockwise;
• step 20, respectively coating a layer of photo alignment polymer on the TFT substrate and the CF substrate to respectively form photo alignment films;
• step 30, providing the mask, and the mask comprises a pattern unit, and a shape and a size of the pattern unit is the same as a shape and a size of the pixel region, and the pattern unit comprises a transparent photic region and an opaque shading region, and a shape and a size of the photic region is the same as a shape and a size of one sub region of the pixel region and the shading region is the same as a shape and a size of other three sub regions of the pixel region;
• step 40, positioning the CF substrate on a rotatable stage, and employing the mask to implement linear UV light irradiation to the layer of photo alignment polymer on the CF substrate according to a certain irradiation angle, and then, the linear UV light aslant penetrates the photic region of the mask and correspondingly irradiates on the first sub regions of the plurality of pixel regions to form a first alignment direction on the layer of photo alignment polymer corresponding to the first sub regions of the plurality of pixel regions;
• maintaining the position of the mask and the certain irradiation angle of the linear UV light constantly unchanged in step 40, and sequentially rotating the pixel region of the substrate 90° with three times through the rotatable stage, and continuing implementing linear UV light irradiation to the layer of photo alignment polymer on the substrate after each rotation, and the linear UV light aslant penetrates the photic region on the mask sequentially and correspondingly irradiates on the second sub region, the third sub region and the fourth sub region of the plurality of pixel regions in order according to the certain irradiation angle, and thus to sequentially form a second alignment direction, a third alignment direction, a fourth alignment direction on the layer of photo alignment polymer corresponding to the second sub region, the third sub region and the fourth sub region of the plurality of pixel regions with the mask constantly steady in the vertical photo alignment method;
• step 50, positioning the TFT substrate on the rotatable stage, and maintaining the position of the mask and the certain irradiation angle of the linear UV light constantly unchanged in step 50, and employing the mask to implement linear UV light irradiation to the layer of photo alignment polymer on the TFT substrate according to the certain irradiation angle, and then, the linear UV light aslant penetrates the photic region of the mask and correspondingly irradiates on the second sub region or the fourth sub region of the pixel region to form a fifth alignment direction on the layer of photo alignment polymer corresponding to the second sub region or the fourth sub region of the pixel region;
• sequentially rotating the pixel region of the substrate 90° with three times through the rotatable stage, and continuing implementing linear UV light irradiation to the layer of photo alignment polymer on the TFT substrate after each rotation, and the linear UV light aslant penetrates the photic region on the mask sequentially and correspondingly irradiates on the third sub region, the fourth sub region and the first sub region or on the first sub region, the second sub region and the third sub region of the pixel region in order according to the certain irradiation angle, and thus to sequentially form a sixth alignment direction, a seventh alignment direction, an eighth alignment direction on the layer of photo alignment polymer corresponding to the third sub region, the fourth sub region and the first sub region or on the first sub region, the second sub region and the third sub region of the pixel region with the mask constantly steady in the vertical photo alignment method;
• step 60, oppositely assembling the TFT substrate and the CF substrate to obtain the liquid crystal display panel;
• then, the first sub region, the second sub region, the third sub region and the fourth sub region on the TFT substrate correspond to the first sub region, the second sub region, the third sub region and the fourth sub region on the CF substrate one by one;
• photo alignment directions of the first sub region, the second sub region, the third sub region and the fourth sub region on the TFT substrate are respectively perpendicular with photo alignment directions of the first sub region, the second sub region, the third sub region and the fourth sub region on the CF substrate.

A vertical photo alignment method with maintaining a position of a mask unchanged, comprising steps of:

• step 1, providing a substrate, and the substrate comprises a pixel region, and the pixel region is a square, and is divided into four square sub regions of equal sizes, which respectively are a first sub region, a second sub region, a third sub region and a fourth sub region;
• step 2, coating a layer of photo alignment polymer on the substrate to form a photo alignment film;
• step 3, providing the mask, and the mask comprises a pattern unit, and a shape and a size of the pattern unit is the same as a shape and a size of the pixel region, and the pattern unit comprises a transparent photic region and an opaque shading region, and a shape and a size of the photic region is the same as a shape and a size of one sub region of the pixel region and a shape and a size of the shading region is the same as a shape and a size of other three sub regions of the pixel region;
• step 4, positioning the substrate on a rotatable stage, and employing the mask to implement linear UV light irradiation to the layer of photo alignment polymer on the substrate according to a certain irradiation angle, and then, the linear UV light aslant penetrates the photic region of the mask and correspondingly irradiates on the first sub region of the pixel region to form a first alignment direction on the layer of photo alignment polymer corresponding to the first sub region of the pixel region;
• maintaining the position of the mask and the certain irradiation angle of the linear UV light constantly unchanged in step 4, and sequentially rotating the pixel region of the substrate 90° with three times through the rotatable stage, and continuing implementing linear UV light irradiation to the layer of photo alignment polymer on the substrate after each rotation, and the linear UV light aslant penetrates the photic region on the mask sequentially and correspondingly irradiates on the second sub region, the third sub region and the fourth sub region of the pixel region in order according to the certain irradiation angle, and thus to sequentially form a second alignment direction, a third alignment direction, a fourth alignment direction on the layer of photo alignment polymer corresponding to the second sub region, the third sub region and the fourth sub region to obtain the alignment film having four alignment directions and the pixel region comprises the four sub regions having four alignment directions with the mask constantly steady in the vertical photo alignment method;
• wherein in step 4, the linear UV light irradiation is implemented to the layer of photo alignment polymer according to the certain irradiation angle that an included angle between the linear UV light and the substrate is 80°-89.7°;
• wherein in step 1, the provided substrate is a TFT substrate or a CF substrate.