Alignment mark, method of measuring wafer alignment, and method of manufacturing a semiconductor device using the method of measuring wafer alignment

A method of measuring wafer alignment, the method comprising:

• providing a first mark pattern including a first line pattern and a second line pattern, each of the first and second line patterns extending along a corresponding line that extends in a first direction on a wafer;
• providing a second mark pattern including a plurality of first discrete patterns and a plurality of second discrete patterns, each of the plurality of first discrete patterns overlapping the first line pattern in a top down view, the plurality of first discrete patterns spaced apart from each other in the first direction, each of the plurality of second discrete patterns overlapping the second line pattern in the top down view, the plurality of second discrete patterns spaced apart from each other in the first direction;
• irradiating an optical signal onto the first mark pattern and the second mark pattern;
• obtaining coordinates of the second mark pattern by detecting signals from the second mark pattern;
• and
• calculating an alignment deviation of the first and second mark patterns from a reference position by comparing coordinates of the second mark pattern with coordinates of the reference position,
• wherein the first line pattern is spaced apart from the second line pattern in a second direction perpendicular to the first direction,
• wherein one of the plurality of the first discrete patterns and a closest one of the plurality of the second discrete patterns to the one of the plurality of the first discrete patterns are disposed on an oblique line that makes a first oblique angle with respect to the first direction.