Method for producing SiC single crystal
AssigneeToyota Jidosha Kabushiki Kaisha
InventorsKazuaki Seki, Kazuhito Kamei, Kazuhiko Kusunoki, Katsunori Danno, Hironori Daikoku, Masayoshi Doi
Life of this patent
Estimating the term…
Loading patent…
AssigneeToyota Jidosha Kabushiki Kaisha
InventorsKazuaki Seki, Kazuhito Kamei, Kazuhiko Kusunoki, Katsunori Danno, Hironori Daikoku, Masayoshi Doi
Estimating the term…
A production method according an embodiment of the present invention is to produce a SiC single crystal by a solution growth technique, and includes a formation step and a growth step. In the formation step, material of Si—C solution contained in a crucible is melted, and a Si—C solution is formed. In the growth step, a SiC seed crystal attached to a bottom end of a seed shaft is brought into contact with the Si—C solution, and a SiC single crystal is grown on a crystal growth surface of the SiC seed crystal. In the growth step, while a temperature of the Si—C solution is being raised, the SiC single crystal is grown. The SiC single crystal production method according to the embodiment facilitates production of a SiC single crystal of a desired polytype.
A method for producing a SIC single crystal by a solution growth technique, the method comprising:
A method for producing a SIC single crystal, the method comprising:
Dependencies are inferred from the claim text.