EPI base ring

A process chamber for processing a substrate, comprising:

• a substrate support disposed within the process chamber, the substrate support having a substrate support surface;
• a lower dome disposed relatively below the substrate support;
• an upper dome disposed relatively above the substrate support, the upper dome being opposed to the lower dome;
• and
• a ring body to be disposed within an inner circumference of the process chamber, the ring body comprising:
• a substrate loading port;
• a gas inlet;
• a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body;
• an upper trench formed in a top surface of the ring body;
• and
• a lower trench formed in a bottom surface of the ring body;
• a first ring removably disposed within the upper trench of the ring body, the first ring and the upper trench define a first annular channel therebetween;
• a first wall extending upwardly from the top surface of the ring body, the first wall is disposed around an inner circumference of the ring body, and an outer portion of the first wall and an inner portion of the first ring define a first annular trench;
• a second ring removably disposed within the lower trench of the ring body, the second ring and the lower trench define a second annular channel therebetween;
• and
• a second wall extending downwardly from the bottom surface of the ring body, the second wall is disposed around an inner circumference of the ring body, and an outer portion of the second wall and an inner portion of the second ring define a second annular trench,
• wherein each of the first annular trench and the second annular trench is to receive an O-ring to be disposed within the first annular trench and the second annular trench, and the first annular channel and the second annular channel are in fluid communication with a fluid source.

A base ring assembly for a substrate processing chamber, comprising:

• a ring body to be disposed within an inner circumference of the substrate processing chamber, the ring body having:
• a substrate loading port;
• a gas inlet;
• a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body;
• an upper trench formed in a top surface of the ring body;
• and
• a lower trench formed in a bottom surface of the ring body;
• a first ring removably disposed within the upper trench of the ring body, wherein the first ring has a general “H” shaped cross-section, and the first ring and the upper trench define a first annular channel therebetween;
• a first wall extending upwardly from the top surface of the ring body, wherein an outer portion of the first wall and an inner portion of the first ring define a first annular trench;
• a second ring removably disposed within the lower trench of the ring body, wherein the second ring has a general “H” shaped cross-section, the second ring and the lower trench define a second annular channel therebetween;
• and
• a second wall extending downwardly from the bottom surface of the ring body, wherein an outer portion of the second wall and an inner portion of the second ring defines a second annular trench.