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US 10,119,189 B2Granted
Biocompatible multilayer-thin-film-type coating as a surface treatment for biomedical substrates, and method for the production thereof
AssigneeUniversidad Del Valle
InventorsFederico Sequeda Osorio, Jose Oscar Gutierrez Montes, Alexander Ruden Muñoz
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Abstract
The present invention discloses a process for the manufacture of a thin-film multilayered coating used in treating biomedical substrates and a coating in multilayered thin-film form (S/TiN/Ti/TiZr) to treat biomedical substrates used in surgical implants.
Claims3
A process to manufacture a thin-film multilayered coating for the treatment of biomedical substrates, comprising:
- polishing the substrate surface to a granulometry of between 700 and 2500 to generate a mirror surface finish;
- washing the substrate with acetone in ultrasound for 10 to 20 min;
- submerging the substrate in a PVD-DC magnetron sputtering reactor at a temperature of between 20 and 25° C., vacuum of 5.1×10-6 torr, and 50 to 60% relative humidity;
- depositing a TiN coating layer with thickness of between 550 and 590 nm from a Ti precursor target (99.99%) at a pressure of 2 to 4 mtorr, argon flow between 8 and 12 sccm, nitrogen flow between 0.1 and 0.2 sccm, precursor target potential between 80 and 120 W, polarization voltage from −50 to −120 V, and interelectrode distance between 8 and 12 cm;
- depositing the Ti coating layer with thickness between 550 and 590 nm from a Ti precursor target (99.99%) at a pressure from 2 to 4 mtorr, argon flow between 8 and 12 sccm, precursor target potential between 80 and 120 W, polarization voltage from −50 to −120 V, and interelectrode distance between 8 and 12 cm;
- and
- depositing the TiZr coating layer with thickness between 550 and 590 rim from a TiZr precursor target (30-70%) at a pressure from 2 ;
- to 4 mtorr, argon flow between 8 and 12 sccm, precursor target potential between 60 and 100 W, polarization voltage from −50 to −120 V, and interelectrode distance between 8 and 12 cm.
5 more elements
A coated biomedical substrate, comprising:
- a multilayered thin-film coat comprising a TiN coating layer having a thickness of between 550 and 590 nm over the substrate;
- an intermediate layer of Ti having a thickness of between 550 and 590 nm;
- and
- an external TiZr layer having a thickness between 550 and 590 nm.
1 more element
Dependencies are inferred from the claim text.