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US 10,119,103 B2Granted
Cleaning liquid and method for cleaning
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTatsuo Goto, Kenji Seki
Life of this patent
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Abstract
A cleaning liquid including hydrofluoric acid, a tetrazole compound, and water. The tetrazole compound may be represented by the following Formula (B1) in which R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group.
Claims19
A cleaning liquid comprising:
- hydrofluoric acid;
- a tetrazole compound;
- and
- water,
- wherein the pH of the cleaning liquid is between 4.77 and 5.27.
2 more elements
A cleaning liquid comprising:
- hydrofluoric acid;
- a tetrazole compound;
- and
- water,
- wherein the tetrazole compound is represented by the following Formula (B1):
- wherein R1 is an alkyl group optionally substituted with a dialkylamino group, and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group or an organic group.
3 more elements
A cleaning liquid consisting essentially of:
- hydrofluoric acid;
- a tetrazole compound;
- water;
- a basic compound;
- and
- a water-soluble organic solvent.
3 more elements
Dependencies are inferred from the claim text.