Stereolithography system

Abstract

A stereolithography system comprises an emitting device and a tank disposed above the emitting device. The tank has a first optically transparent bottom wall and a second optically transparent bottom wall with a space disposed therebetween. There is a linear stage that extends away from the tank and a carrier platform is moveable along the linear stage away from the tank. There is also a wettable material at a bottom wall of the tank within the tank. A fluid cooling system is in fluid communication the space disposed between the first optically transparent bottom wall of the tank and the second optically transparent bottom wall of the tank.

Dependencies are inferred from the claim text.