Process for producing a three-dimensional structure

A method for producing a three-dimensional overall structure (18) by an energy irradiation method in a lithography material that is structurable by energy input via a structuring device (10a, 10b), which has a predefined principal direction (16) of the structure entry in a writing region (20), the method comprising:

• writing the overall structure (18) by sequential writing of a plurality of partial structures (22) that complement one another overall to form the overall structure (18),
• delimiting the partial structures (22) in each case within enveloping interfaces (36), and
• writing the partial structures (22) such that the enveloping interfaces (36) run obliquely with respect to the principal direction (16) of the structure entry,
• wherein the lithography material is polymerized by two-photon absorption or multi-photon absorption in at least one focus region (32) of at least one writing beam (14), said at least one focus region is spatially displaceable within the writing region (20), and
• wherein the interface (36), which borders a respective partial structure (22) in a direction opposite to partial structures (22) that are already present, is running such that said interface (36) forms an outer side (38) of the partial structures and the outer side (38) is completely visible from a viewing point (P) spaced apart opposite to the principal direction (16), the method further comprising:
• providing a data set representing the overall structure (18), and determining further data sets therefrom in a computer-aided manner, said further data sets representing the partial structures (22), and controlling the structuring device (10a, 10b) in accordance with the data sets.