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US 10,118,195 B2Granted
Methods for depositing a transparent thin film onto substrates using an atmospheric plasma generating device
AssigneeThe Boeing Company
InventorsCharles A. Smith, Thai H. Sweitzer
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Abstract
Methods are disclosed for delivering a substantially homogeneous and substantially transparent single film coating comprising siloxane-containing precursor materials onto a substantially transparent substrate surface on large components via atmospheric pressure plasma deposition techniques.
Claims7
A method for depositing a thin film onto a substantially transparent substrate, the method comprising:
- positioning an atmospheric pressure plasma generating device proximate to a substrate;
- delivering a carrier material to the atmospheric pressure plasma generating device;
- generating a plasma in the atmospheric pressure plasma generating device;
- delivering a plurality of combined precursor materials to the atmospheric pressure plasma generating device to form a plasma doped with the combined precursor materials;
- controlling the flow of the plurality of combined precursor materials to the atmospheric pressure plasma generating device;
- and
- depositing at atmospheric pressure a substantially homogeneous and a substantially transparent single layer coating onto the substrate.
4 more elements
Dependencies are inferred from the claim text.