Method for producing nanosurfaces with nano, micron, and/or submicron structures on a polymer

A process for preparing a modified polymeric material, said process comprising:

• providing a polymer, wherein the polymer is polyetheretherketone (PEEK);
• and
• subjecting the polymer to a high vacuum treatment regimen under conditions effective to modify a surface of the polymer by introducing to the surface of the polymer features selected from the group consisting of nanoscale features, micron scale features, and submicron scale features,
• wherein said high vacuum treatment regimen comprises simultaneously heating the polymer at a temperature of between 275° C. and 400° C. and incubating the polymer in a vacuum chamber under high vacuum conditions in a range of 10−2 Torr to 10−6 Torr effective to modify the surface of the polymer,
• wherein said subjecting comprises:
• (a) loading the polymer at a first temperature;
• (b) increasing the temperature during a ramp-up period to a second temperature of 275° C. to 400° C.;
• (c) maintaining the polymer at the second temperature;
• (d) then, decreasing the temperature by 125° C. to 250° C. during a ramp-down period to a third temperature;
• and
• (e) after the ramp-down period, extracting the polymer.