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US 10,095,103 B2Granted
Photomask and method of forming fine pattern using the same
AssigneeSamsung Display Co., Ltd.
InventorsKwang Woo Park, Jun Hyuk Woo, Jeong Won Kim, Seung Bo Shim, Jin Ho Ju
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Abstract
A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.
Claims18
A photomask, comprising:
- a transparent substrate;
- and
- a plurality of filter layers disposed on the transparent substrate,
- wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough and is disposed on the first filter layer, the first-wavelength light and the second-wavelength light have different wavelengths from each other, and
- wherein part of the second filter layer overlaps an entire surface of the first filter layer.
2 more elements
A method of forming a fine pattern, the method comprising:
- forming a resist layer by applying photoresist onto a first substrate;
- placing a photomask over the resist layer;
- and
- forming a resist pattern by exposing the resist layer to light through the photomask with the use of an exposure device, which generates light of a predetermined wavelength, and developing the resist layer,
- wherein the photomask includes a second substrate and a plurality of filter layers disposed on the second substrate, the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough and is disposed on the first filter layer, the first-wavelength light and the second-wavelength light have different wavelengths from each other, and part of the second filter layer overlaps an entire surface of the first filter layer.
2 more elements
Dependencies are inferred from the claim text.