Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films
AssigneeL'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges Claude
InventorsClément Lansalot-Matras, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
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Abstract
Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)(NR2)4 Formula I, M(=O)2(NR2)2 Formula II, and M(=NR)2(OR)2 Formula III, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR′3, wherein R′ is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
Claims19
A Group 6 film forming composition comprising a Group 6 transition metal-containing precursor having the formula:
- Mo(═O)(NR2)4
- wherein each R is independently H, a C1 to C6 alkyl group, or SiR′3,
- wherein R′ is H or a C1 to C6 alkyl group.
Dependencies are inferred from the claim text.