Stage apparatus, lithography apparatus, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMasanori Yamada
Life of this patent
Estimating the term…
Abstract
A stage apparatus includes: a coarse moving stage; a fine moving stage located at an interval from the coarse moving stage in a first direction; an electromagnetic actuator including a first core located on one of the coarse moving stage and the fine moving stage and a second core located on the other of the coarse moving stage and the fine moving stage and configured to accelerate or decelerate the fine moving stage in a second direction perpendicular to the first direction; and a controller configured to correct a command value of a thrust of the electromagnetic actuator in the second direction in accordance with a relative position of the fine moving stage with respect to the coarse moving stage in the first direction.
Claims11
A stage apparatus comprising:
- a coarse moving stage;
- a fine moving stage;
- an electromagnetic actuator including a first core located on the coarse moving stage and a second core located on the fine moving stage and configured to accelerate or decelerate the fine moving stage in a first direction in which the first core and the second core are arranged with a first side of the first core and a second side of the second core opposing each other;
- and
- a controller configured to correct a command value of a thrust of the electromagnetic actuator in the first direction in accordance with an opposing area of a difference between a length of the first side of the first core and a length of the second side of the second core in a second direction perpendicular to the first direction,
- wherein the controller corrects the command value using a first correction amount in a case where the opposing area of the difference between the length of the first side of the first core and the length of the second side of the second core is a first area and corrects the command value using a second correction amount which is larger than the first correction amount in a case where the opposing area of the difference between the length of the first side of the first core and the length of the second side of the second core is a second area which is smaller than the first area.
A lithography apparatus for forming a pattern of an original on a substrate, the lithography apparatus comprising:
- a stage apparatus configured to hold at least one of the original and the substrate,
- the stage apparatus including:
- a coarse moving stage;
- a fine moving stage;
- an electromagnetic actuator including a first core located on the coarse moving stage and a second core located on the fine moving stage and configured to accelerate or decelerate the fine moving stage in a first direction in which the first core and the second core are arranged with a first side of the first core and a second side of the second core opposing each other;
- and
- a controller configured to correct a command value of a thrust of the electromagnetic actuator in the first direction in accordance with an opposing area of a difference between a length of the first side of the first core and a length of the second side of the second core in a second direction perpendicular to the first direction,
- wherein the controller corrects the command value using a first correction amount in a case where the opposing area of the difference between the length of the first side of the first core and the length of the second side of the second core is a first area and corrects the command value using a second correction amount which is larger than the first correction amount in a case where the opposing area of the difference between the length of the first side of the first core and the length of the second side of the second core is a second area which is smaller than the first area.
Dependencies are inferred from the claim text.