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AssigneeASML Netherlands B.V.
InventorsPieter Kruit, Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink
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Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.
A method of measuring properties of a massive amount of charged particle beams of a charged particle beam system in which
A sensor for simultaneously measuring one or more of a beam position and a beam spot size Or one or more individual particle beams in a lithography system characterized in that the sensor comprises a converter for converting a particle beam into a light beam, as well as a photon receptor arranged for receiving a light beam emitted by said converter upon incidence of a particle beam, and transforming light from said received light beam into an electronic signal, enabling read out of said signal from the sensor by an electronic control system, its which a beam blocking element, configured to selectively partially and entirely block a beam is provided to the surface of said converter, and in which the blocking element is integrated with said converter and located on top thereof and wherein said detector element is applied integrated with said converter element, located on bottom thereof.
A lithography system for transferring a pattern onto the surface of a target, using a charged particle beam tool, said tool being capable of generating a plurality of charged particle beams for writing said pattern on said surface, thereby turning off and on each beam separately at writing said pattern onto the surface by means of a blanker part of said system, and of at least in advance of a writing action, sensing characteristics of a writing beam using a sensor included in a position apart from said target surface, characterised in that the sensor is arranged in the system for determination of beam position and/or beam spot size, and for directly detecting, all of said writing beams simultaneously, the sensor thereto comprising a converter converting each of said particle beans into a light beam, the sensor further comprising an array of light sensitive elements such as photodiode elements, for detecting such light beams, and for generating an electron charge upon exposure to light, which array is read out at least virtually simultaneously by a calculating unit providing correcting value signals upon such read out to a controller of the particle beam tool, and/or to a controller for said pattern, for modifying electronic data representing said pattern, in which both physical displacement of a beam spot and time delay of a blanking part for blanking a beam are measured, in which the sensor further comprises a blocking element, configured to selectively partially and entirely block a beam, included on top of said converter, and wherein said detector element is applied integrated with said converter element, located on bottom thereof.
A multi-beam charged particle system comprising a multi beam charged particle tool configured to generate multiple charged particle beams, the system comprising:
A sensor for detecting charged particle beams of a multi-beam charged particle tool, the sensor comprising:
Dependencies are inferred from the claim text.