Lithographic apparatus and a device manufacturing method

An A substrate table for an immersion lithographic apparatus, the immersion lithographic apparatus comprising:

• a projection system configured to project radiation onto a substrate, wherein the substrate table comprising comprises:
• a recess having a central support section configured to support a the substrate, the central support section having a support surface having a protrusion to contact a bottom surface of the substrate and having a lateral surface at a non-zero angle non-parallel to the support surface, and
• a peripheral section of the substrate table that surrounds the central support section and defines the recess, the peripheral section being effectively thermally isolated from the central support section and the substrate when supported on the central support section, and the peripheral section comprising a drain opening arranged to face the recess and configured to receive an immersion fluid which leaks, in use, into a gap between an edge of the substrate when supported on the substrate table and an edge of the recess, wherein a cross-section across the face of the drain opening is arranged to be non-parallel to the support surface and wherein at least part of the lateral surface of the central support section is spaced by an open gap from at least part of a lateral surface of the peripheral section, the lateral surface of the peripheral section is outward, in a horizontal direction, of an outer periphery of the bottom surface of the substrate when supported on the substrate table, and
• a solid member spanning the open gap to directly connect the central support section and the peripheral section;
• and a projection system configured to project radiation onto the substrate.

A device manufacturing method comprising:

• providing a substrate to a recess in a substrate table, the recess having a central support section supporting the substrate, the central support section having:
• a support surface having a protrusion that contacts a bottom surface of the substrate,
• a lateral surface at a non-zero angle non-parallel to the support surface, and
• a bottom surface at a non-zero angle non-parallel to the lateral surface and facing away from the support surface, the lateral surface extending to the bottom surface of the central support section;
• providing immersion fluid to an upper surface of the substrate and/or the substrate table;
• draining the immersion fluid that leaks into a gap between an edge of the substrate supported on the substrate table and an edge of the recess through a drain opening located in a peripheral section of the substrate table, the drain opening facing the recess and located above the bottom surface of the central support section and a cross-section across the face of the drain opening is non-parallel to the support surface, the peripheral section surrounding the central support section and defining the recess, and the peripheral section being effectively thermally isolated from the central support section and the substrate supported on the central support section, wherein a lateral surface of the peripheral section faces, and is spaced by an open gap from, the lateral surface of the central support section, the lateral surface of the peripheral section being outward, in a horizontal direction, of an outer periphery of the bottom surface of the substrate;
• and
• providing thermal transfer in the substrate table using a heater and/or a channel configured to convey a heat transfer fluid;
• and
• projecting radiation onto the substrate.