Method for detecting particles and defects and inspection equipment thereof
AssigneeHitachi High-Technologies Corporation
InventorsTakahiro Togashi, Shigeru Matsui
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AssigneeHitachi High-Technologies Corporation
InventorsTakahiro Togashi, Shigeru Matsui
Estimating the term…
A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.
An inspection apparatus which detects an anomaly of a substrate comprising;
A method for detecting an anomaly of a substrate, the method comprising steps of:
A method for detecting an anomaly of an object, the method comprising steps of:
The inspection apparatus according claim 26, further comprising:
The inspection apparatus according to claim 26, wherein said illumination distribution is two-dimensional matrix data.
The inspection apparatus according to claim 26, wherein said relative illumination distribution is expressed by a two-dimensional Cartesian coordinate system.
An inspection apparatus which detects an anomaly of an object comprising;
Dependencies are inferred from the claim text.