Phosphor and phosphor film for electron beam excitation and color display apparatus using the same
AssigneesDowa Electronics Materials Co., Ltd., Nichia Corporation
InventorsMasahiro Gotoh, Akira Nagatomi, Kenji Sakane, Shuji Yamashita
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Abstract
To provide a phosphor for an electron beam excitation with a small deterioration in an emission efficiency and capable of maintaining a high luminance, even when an excitation density of an electron beam for a phosphor excitation is increased. As raw materials, Ca3N2(2N), AlN(3N), Si3N4(3N), and Eu2O3(3N) are prepared, and the raw materials thus prepared are measured and mixed, so that a molar ratio of each element becomes (Ca+Eu):Al:Si=1:1:1. Then, the mixture thus obtained is maintained and fired for at 1500° C. for 3 hours, and thereafter crushed, to manufacture the phosphor having a composition formula Ca0.985SiAlN3:Eu0.015.
Claims14
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN3:Eu, wherein a film thickness is 65 μm or less.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm2 or less per unit area.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm2 or less per unit area.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN3:Eu, wherein a phosphor coating amount is 7.0 mg/cm2 or less per unit area.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm2 or less per unit area.
A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm2 or less per unit area.
Dependencies are inferred from the claim text.