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US RE42,741 E1Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsAleksey Yurievich Kolesnychenko, Jan Evert Van Der Werp
Life of this patent
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Abstract
Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
Claims21
A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
- a support structure configured to hold a patterning device, the patterning device being capable of imparting the a radiation beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to supply a liquid between the projection system and the substrate and arranged, such that in use, there is a space not occupied by liquid between the liquid and the substrate.
3 more elements
A device manufacturing method comprising:
- providing a liquid between a projection system of a lithographic apparatus and a substrate, the liquid forming a liquid lens;
- and
- projecting a patterned radiation beam through the liquid, then through a space, and then onto a target portion of the substrate using the projection system.
A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
- a support structure configured to hold a patterning device, the patterning device being capable of imparting the a radiation beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to supply a peripherally confined portion of liquid between the projection system and the substrate, the substrate being vertically above the configured portion of the liquid, and wherein a space exists between the confined portion of liquid and the substrate.
3 more elements
Dependencies are inferred from the claim text.