Scintillator panel, radiation image sensor and methods of producing them

A scintillator panel manufacturing method comprising the steps of:

• preparing a heat-resistant, light-transmitting substrate;
• forming a dielectric multilayer film mirror with desired reflection characteristics by laminating multiple dielectric layers of predetermined thickness onto the substrate;
• forming by depositing a plurality of columnar structures of a scintillator, which converts radiation into light, on said dielectric multilayer film mirror, wherein the step of forming the dielectric multilayer film mirror is performed prior to the step of forming by depositing the plurality of columnar structures of the scintillator on the dielectric multilayer film mirror,
• forming a light-reflection preventing member on the surface of the substrate at the side opposite the surface on which said dielectric multilayer film mirror is formed;
• and
• priorly or subsequently covering at least said scintillator with a protective film,
• wherein a separation preventing layer is formed between said scintillator and said dielectric multilayer film mirror.

A scintillator panel manufacturing method comprising the steps of:

• preparing a heat-resistant, light-transmitting substrate;
• forming a light-transmission restraining film, which restrains light transmission, on the substrate;
• forming a dielectric multilayer film mirror with desired reflection characteristics by laminating multiple dielectric layers of predetermined thickness onto the light-transmission restraining film;
• forming by depositing a plurality of columnar structures of a scintillator, which converts radiation into light, on said dielectric multilayer film mirror, wherein the step of forming the dielectric multilayer film mirror is performed prior to the step of forming by depositing the plurality of columnar structures of the scintillator on said dielectric multilayer film mirror;
• covering at least the scintillator with a protective film;
• and
• further comprising a step of forming a separation preventing layer between said scintillator and said dielectric multilayer film mirror.

A radiation image sensor manufacturing method comprising the steps of:

• preparing a heat-resistant, light-transmitting substrate;
• forming a dielectric multilayer film mirror with desired reflection characteristics by laminating multiple dielectric layers of predetermined thickness onto the substrate;
• forming by depositing a columnar structure of a scintillator, which converts radiation into light, on said dielectric multilayer film mirror, wherein the step of forming the dielectric multilayer film mirror is performed prior to the step of forming by depositing the columnar structure of the scintillator on the dielectric multilayer film mirror;
• preparing a scintillator panel by covering at least said scintillator with a protective film;
• disposing an image pickup device so as to face the scintillator of said scintillator panel,
• disposing a light-reflection preventing member, formed of an elastic body, on the surface of said substrate at the side opposite the surface on which the scintillator is formed, and
• housing said image pickup device and said light-reflection preventing member inside a housing,
• wherein a separation preventing layer is disposed between said scintillator and said dielectric multilayer film mirror.

A scintillator panel comprising:

• a heat-resistance substrate at a high temperature;
• at least one metal reflective film, deposited over the substrate;
• dielectric layers, having refractive indexes different from each other, deposited over the at least one metal reflective film;
• and
• a scintillator, deposited over the dielectric layers, such that said dielectric layers and the at least one metal reflective film are located on a side of said scintillator opposite a radiation incident side of said scintillator,
• wherein the dielectric layers can be formed at the high temperature.