Process for producing a fluorine atom-containing sulfonyl fluoride compound
AssigneeAsahi Glass Company, Limited
InventorsMasahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeAsahi Glass Company, Limited
InventorsMasahiro Ito, Kunio Watanabe, Takashi Okazoe, Isamu Kaneko, Daisuke Shirakawa
Estimating the term…
The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc., EF1 is a monovalent group formed by the decomposition of EF, and X is a halogen atom.
A process for producing a fluorine atom-containing sulfonyl fluoride compound, which comprises reacting a compound of the following formula (1) with a compound of the following formula (2) to form a compound of the formula (3), then, reacting the compound of the formula (3) with fluorine in a liquid phase to form a compound of the following formula (4), and further, decomposing the compound of the formula (4) to obtain a compound of the following formula (5):
A compound of the following formula (3a):
Dependencies are inferred from the claim text.