Scanning type exposure apparatus and exposure method

A method of exposing a pattern image of a mask to a substrate via a plurality of projection optical systems, comprising the steps of:

• detecting a change of shape of said substrate;
• changing a magnification of at least one of said projection optical systems in accordance with the change of shape of said substrate;
• and
• changing the position of an image projected via said at least one projection optical system in accordance with the change of magnification of said at least one projection optical system.

A scanning type exposure apparatus comprising:

• a plurality of projection optical systems for respectively projecting a pattern image of a mask onto a substrate;
• a moving device for moving said mask and said substrate relative to said projection optical systems, while holding said mask and said substrate together;
• and
• an adjusting device for detecting a change of shape of said substrate, and for adjusting at least one imaging characteristic of said projection optical systems.

An exposure apparatus for exposing a pattern of a mask onto a substrate, comprising:

• an image transfer system that projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other;
• an imaging characteristic adjusting mechanism disposed in a space between the mask and the substrate, to adjust imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate;
• and
• an exposure system that exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.

A scanning exposure apparatus comprising:

• an image transfer system that projects a pattern on a mask onto a substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate;
• and
• an imaging characteristic adjusting mechanism that adjusts imaging characteristics of a portion of the image transfer system that projects the pattern of the mask onto the substrate, the imaging characteristic adjusting mechanism disposed in a space that includes the substrate and the portion of the image transfer system that projects the pattern onto the substrate;
• the image transfer system performing a transfer of the pattern on the mask onto the substrate by overlapping transfer of the pattern onto the substrate.

A method of performing exposure with a scanning exposure apparatus, comprising the steps of:

• utilizing an image transfer system to project an image of a pattern on a mask onto a substrate to form the pattern onto the substrate while moving the mask and the substrate synchronously;
• and
• adjusting at least one imaging characteristic of a portion of the image transfer system that projects the pattern onto the substrate, the adjusting being accomplished by using an imaging characteristic adjusting mechanism disposed in a space that includes the substrate and the portion of the image transfer system that projects the pattern onto the substrate;
• wherein the imaging transfer system transfers the pattern on the mask onto the substrate by overlapping transfer of the pattern onto the substrate.

An exposure apparatus for exposing a pattern of a mask onto a substrate, comprising:

• image transferring means for transferring the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during projection of the pattern onto the substrate such that portions of the pattern overlap each other;
• imaging characteristic adjusting means disposed in a space between the mask and the substrate, to adjust imaging characteristics of a portion of the image transferring means that projects the pattern onto the substrate;
• and
• exposing means for exposing the pattern during the synchronous movement of the mask and the substrate by the image transferring means.