Parallel type nonvolatile semiconductor memory device and method of using the same
AssigneeHitachi, Ltd.
InventorsMasataka Kato, Tetsuo Adachi, Hitoshi Kume, Takashi Kobayashi
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AssigneeHitachi, Ltd.
InventorsMasataka Kato, Tetsuo Adachi, Hitoshi Kume, Takashi Kobayashi
Estimating the term…
On a semiconductor substrate of a first conductive type is formed a well layer of the same conductive type as that of the substrate in electrically separated that is, physically separated and electrically isolated, from the substrate, and a MOS transistor, used as a nonvolatile memory cell, forming a drain region and a source region respectively within the well layer is used as a memory cell. Well layers associated with different columns are connected to each other by a well wiring commonly so that operation voltage different from that of the semiconductor substrate is applied thereto. In the case of data erasing, prescribed positive voltage is applied to a well wiring, and prescribed voltage lower than said positive voltage is applied to a selected word line. In the case of data programming, prescribed negative voltage is applied to the well wiring, prescribed voltage higher than said negative voltage is applied to the selected word line.
In combination with a semiconductor memory device comprising memory arrays connected in parallel,
Dependencies are inferred from the claim text.