Metal selective polymer removal
AssigneeFSI International, Inc.
InventorsBrynne K. Bohannon, Daniel J. Syverson
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Abstract
A metal selective polymer removal process is disclosed which prevents metal lift-off for use especially suited for ULSI fabrication.
Claims19
A process for removal of ..metal etch.!. byproducts from a metal etch from a semiconductor wafer comprising the following steps:
- introducing HF into a chamber containing said wafer which includes non-water soluble byproducts thereon;
- introducing N.sub.2 +xH.sub.2 O, where x is a real number, into said chamber;
- and
- removing soluble byproducts from said wafer after performing the above steps.
A process for removing post etch metal silicate-containing residue from a metal structure comprising the following steps:
- introducing vapor HF into a chamber containing said metal structure which includes non water soluble residue thereon;
- passing a gas over water and introducing the result into said chamber;
- and
- removing said post etch metal silicate-containing residue from said structure after performing the above steps.
A process for removing sidewall polymer from the posts of a deformable mirror device comprising the following steps:
- introducing HF into a chamber containing said device which includes non-water soluble byproducts thereon,
- introducing N.sub.2 +xH.sub.2 O, where x is a real number, into said chamber;
- and
- removing soluble byproduct from said device after performing the above steps.
A process for removing post etch residue from a metal structure comprising the following steps:
- introducing anhydrous HF into a chamber containing said metal structure which includes non water soluble residue thereon;
- introducing water vapor into said chamber;
- and
- removing said post etch residue from said structure after performing the above steps.
A process for removing post etch residue from a metal structure comprising the following steps:
- introducing anhydrous HF into a chamber containing said metal structure which includes non water soluble residue thereon;
- passing a gas over water and introducing the result into said chamber;
- and
- removing said post etch residue from said structure after performing the above steps.
Dependencies are inferred from the claim text.