Method to produce gamma titanium aluminide articles having improved properties
AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorsYoung-Won Kim, Dennis M. Dimiduk
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AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorsYoung-Won Kim, Dennis M. Dimiduk
Estimating the term…
Methods are presented to produce duplex (DP) microstructures, nearly lamellar (NL) microstructures, and fully TMT lamellar (TMTL) microstructures in gamma titanium aluminide alloy articles. The key step for obtaining a specific type of microstructure is the post-hot work annealing treatment at a temperature in a specific range for the desired microstructure. The annealing temperatures range from Te+100° C. to Tα−25° C. for duplex (DP) microstructures, from Tα−25° C. to Tα−5° C. for nearly lamellar (NL) microstructures, and from Tα to Tα+60° C. for fully TMT lamellar (TMTL) microstructures, where Te is the titanium-aluminum eutectoid temperature of the alloy and Tα is the alpha transus temperature of the alloy. The times required for producing specific microstructures range from 2 min to 15 hours depending on microstructural type, alloy composition, annealing temperature selected, material section size, and desired grain-size. The heating rate to the post-hot work annealing treatment is critical and must be fast enough to avoid compositional segregation (in the two-phase field) and uneven grain growth. Cooling schemes and rates after the annealing treatments are determined according to the microstructural features of interest, and their stability.
A process for producing duplex microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing duplex microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing nearly-lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing nearly-lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing fully TMT lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing fully TMT lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing fully lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
A process for producing fully lamellar microstructure in an article of gamma titanium aluminide alloy containing 0.05 to 1.0 atomic percent boron, which comprises the steps of:
Dependencies are inferred from the claim text.