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US D901,407 S1Granted
Integrated type ion shield for semiconductor manufacturing apparatus
AssigneeHitachi High-Tech Corporation
InventorsYutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Nobuya Miyoshi, Kohei Kawamura, Hiroyuki Kobayashi
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Abstract
The abstract isn’t available for this document.
Claims1
The ornamental design for an integrated type ion shield for semiconductor manufacturing apparatus, as shown and described.