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US 9,963,548 B1Granted
Solvent resistant, aromatic polyamide films for transparent flexible substrates
AssigneeAkron Polymer Systems, Inc.
InventorsLimin Sun, Dong Zhang, Frank W. Harris, Jiaokai Jing
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Abstract
Solvent resistant, transparent films prepared from solutions of aromatic polyamides and multi-functional carboxylic acids in polar aprotic solvents are described herein. Solvent resistance is achieved by heating the films for a short time above 300° C. near the polyamide Tg. The films have CTEs less than 40 ppm/° C. and are optically clear displaying transmittance above 75% between 400 and 750 nm. The films are useful as substrates for flexible electronic devices.
Claims12
A solvent resistant, transparent, aromatic polyamide film, comprising:
- a) an aromatic polyamide that is soluble in polar aprotic solvents in the absence of inorganic salts and has one or more repeat units of general formula (I):
- wherein Ar1 is selected from the group of aromatic units as shown in the following general structures:
- wherein p is 1 to 4, q is 1 to 3;
- R1, R2, R3, R4, R5 are selected from the group consisting of hydrogen, halogens (fluoride, chloride, bromide and iodide), alkyls, substituted alkyls, nitro, cyano, thioalkyl, alkoxy, aryls, substituted aryls, alkyl esters, substituted alkyl esters, and combinations thereof, wherein when p is less than 1 or q is less than 3 the remaining positions on the aromatic ring are y hydrogen atoms;
- wherein G1 is selected from a group consisting of a covalent bond;
- a CH2 group;
- a C(CH3)2 group;
- a C(CF3)2 group;
- a C(CX3)2 group wherein X is a halogen;
- a CO group;
- an O atom;
- a S atom;
- a SO2 group;
- a Si (CH3)2 group;
- 9, 9-fluorene group;
- substituted 9, 9-fluorene;
- and an OZO group wherein Z is a aryl group or substituted aryl such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, or substituted 9, 9-bisphenylfluorene;
- wherein Ar2 is selected from the group of aromatic units as shown in the following general structures:
- wherein p is 1 to 4;
- R6, R7, R8, are selected from the group consisting of hydrogen, halogen (fluoride, chloride, bromide and iodide), alkyl, substituted alkyls, nitro, cyano, thioalkyl, alkoxy, aryls, substituted aryls, alkyl esters, substituted alkyl esters, and combinations thereof, wherein when p is less than 4 the remaining positions on the aromatic ring are hydrogen;
- wherein G2 is selected from a group consisting of a covalent bond;
- a CH2 group;
- a C(CH3)2 group;
- a C(CF3)2 group;
- a C(CX3)2 group wherein X is a halogen;
- a CO group;
- an O atom;
- a S atom;
- a SO2 group;
- a Si (CH3)2 group;
- 9, 9-fluorene group;
- substituted 9, 9-fluorene;
- and an OZO group wherein Z is a aryl group or substituted aryl such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, or substituted 9, 9-bisphenylfluorene, wherein when p is less than 4 the remaining positions on the aromatic ring are hydrogen;
- and,
- b) a multifunctional carboxylic acid compound in an amount of about 3 wt % to about 9 wt % based on the weight of the soluble, aromatic polyamide;
- wherein the multifunctional carboxylic acid compound is selected from the group consisting of:
- trimesic acid, 2,4,6,8-naphyltetracarboxylic acid, 3,3′,5,5′-biphenyltetracarboxylic acid, and 2,2′,4,4′-biphenyltetracarboxylic acid,
- wherein a precursor film is formed by combining at least the aromatic polyamide and the multifunctional carboxylic acid compound and wherein the precursor film exposed to temperatures from about 300° C. to less than 350° C. for less than about one hour to form the solvent resistant film with an average coefficient of thermal expansion that is less than 40 ppm/° C. between 30 and 200° C.
35 more elements
Dependencies are inferred from the claim text.