Method for separating group 13 element nitride layer, and composite substrate
AssigneeNGK Insulators, Ltd.
InventorsKatsuhiro Imai, Makoto Iwai, Takanao Shimodaira
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AssigneeNGK Insulators, Ltd.
InventorsKatsuhiro Imai, Makoto Iwai, Takanao Shimodaira
Estimating the term…
A composite substrate includes a sapphire substrate and a layer of a nitride of a group 13 element provided on the sapphire substrate. The layer of the nitride of the group 13 element is composed of gallium nitride, aluminum nitride or gallium aluminum nitride. The composite substrate satisfies the following formulas (1), (2) and (3). A laser light is irradiated to the composite substrate from the side of the sapphire substrate to decompose crystal lattice structure at an interface between the sapphire substrate and the layer of the nitride of the group 13 element. 5.0≤(an average thickness (μm) of the layer of the nitride of the group 13 element/a diameter (mm) of the sapphire substrate)≤10.0 . . . (1); 0.1≤ a warpage (mm) of said composite substrate×(50/a diameter (mm) of said composite substrate)2≤0.6 . . . (2); 1.10≤a maximum value (μm) of a thickness of said layer of said nitride of said group 13 element/a minimum value (μm) of said thickness of said layer of said nitride of said group 13 element . . . (3)
A method of separating a layer of a nitride of a group 13 element:
A composite substrate comprising a sapphire substrate and a layer of a nitride of a group 13 element provided on said sapphire substrate, said layer of said nitride of said group 13 element comprising gallium nitride, aluminum nitride or gallium aluminum nitride, and said composite substrate satisfying the following formulas (1), (2) and (3),
Dependencies are inferred from the claim text.