Three-dimensional memory device having contact via structures in overlapped terrace region and method of making thereof
AssigneeSanDisk Technologies LLC
InventorsZhixin Cui, Masahiro Wada
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AssigneeSanDisk Technologies LLC
InventorsZhixin Cui, Masahiro Wada
Estimating the term…
Contact areas for three-dimensional memory devices including multiple vertically stacked tier structures can be reduced by overlapping stepped terraces of the tier structures. Sacrificial via structures laterally surrounded by a respective insulating spacer can be formed through an overlying tier structure in the stepped terrace region thereof. After formation of memory stack structures, the sacrificial via structures can be removed to provide first upper via cavities. An isotropic etch can be performed to extend the first upper via cavities to top surfaces of underlying first electrically conductive layers in an underlying tier structure while forming second upper via cavities extending to second electrically conductive layers in the overlying tier structure. First contact via structures extending through the terrace region of the overlying tier structure can provide electrical contact to the first electrically conductive layers, and second contact via structure can be formed in the second upper via cavities.
A three-dimensional memory device comprising:
Dependencies are inferred from the claim text.