Apparatus and method for endpoint detection
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsMorgan Evans, Ross Bandy
Life of this patent
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Abstract
An apparatus to control processing conditions for a substrate. The apparatus may include a current measurement component to perform a plurality of extraction current measurements for extraction current in a processing apparatus housing the substrate, the extraction current comprising ions extracted from a plasma and directed to the substrate; and an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in extraction current during the plurality of extraction current measurements.
Claims13
An apparatus to control processing conditions for a substrate, comprising:
- a plasma chamber;
- an extraction system, the extraction system comprising an extraction plate, adjacent the plasma chamber, the extraction plate having an extraction aperture to extract ions from the plasma chamber and to provide the ions as an ion beam to the substrate;
- a current measurement component to perform a plurality of extraction current measurements for extraction current in a process chamber, disposed on an opposite side of the extraction plate from the plasma chamber and housing the substrate, the extraction current comprising the ions and electron current generated from the substrate;
- and
- an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in the extraction current that is detected by the current measurement component during the plurality of extraction current measurements.
A processing apparatus, comprising:
- a plasma chamber generating ions;
- an extraction system to extract the ions from the plasma chamber and deliver the ions to a substrate, the ions forming a portion of an extraction current;
- and
- a process control system, comprising:
- a current measurement component to perform a plurality of extraction current measurements for the extraction current;
- and
- an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in the extraction current that is detected by the current measurement component during the plurality of extraction current measurements;
- and
- a controller to send a control signal to adjust process conditions of the processing apparatus responsive to the endpoint detection signal, wherein the extraction system comprising an extraction plate adjacent the plasma chamber and having an extraction aperture to direct an ion beam to the substrate.
An apparatus to control processing conditions for a substrate, comprising:
- a current measurement component to perform a plurality of extraction current measurements for extraction current in a processing apparatus housing the substrate, the extraction current comprising ions extracted from a plasma and directed to the substrate and electron current generated from the substrate;
- an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in the extraction current that is detected by the current measurement component during the plurality of extraction current measurements;
- a plasma source to generate the plasma;
- an extraction supply to generate the extraction current;
- a plasma chamber to house the plasma;
- an extraction plate adjacent the plasma chamber and having an extraction aperture to extract the ions from the plasma and provide the ions as an ion beam to the substrate;
- and
- a scanner configured to scan the substrate with respect to the extraction aperture along a scan direction, wherein the extraction aperture has a long axis, wherein the scan direction is perpendicular to the long axis.
Dependencies are inferred from the claim text.