Back to results
US 9,960,070 B2Granted
Chucking warped wafer with bellows
AssigneeKLA-Tencor Corporation
InventorLuping Huang
Life of this patent
Estimating the term…
Abstract
A vacuum chuck has at least one suction assembly that pulls a wafer surface toward a chucking surface. The suction assembly may be used with a wafer that is warped. A suction force engages a pad of a suction assembly with the wafer surface and retracts a bellows of the suction assembly. As the bellows retracts and draws the wafer surface closer to the chucking surface, the suction force provided by the vacuum chuck can pull the wafer flat.
Claims9
A vacuum chuck comprising:
- a body defining a chucking surface and having a suction assembly opening defined by the chucking surface;
- a suction assembly disposed in the suction assembly opening, wherein the suction assembly comprises:
- a base;
- a bellows having a first end and a second end opposite the first end, wherein the second end of the bellows is disposed on the base;
- a pad having a first surface and a second surface opposite the first surface, wherein the second surface of the pad is disposed on the first end of the bellows, wherein the first surface defines a recess in the pad, the pad further comprising at least one channel between the first surface and second surface, the channel being defined by a channel wall;
- a vacuum port in fluid communication with a first volume and a second volume, wherein the first volume is defined by the base, the bellows, and the pad, and wherein the second volume is defined partly by the recess;
- and
- a spring inside the bellows disposed between the base and the pad;
- wherein the first surface of the pad is a distance from the chucking surface in a first position and the first surface of the pad is more proximate the chucking surface in a second position than in the first position.
6 more elements
Dependencies are inferred from the claim text.