Substrate processing apparatus for managing transfer state of substrate gas storage container based on supply flow rate

A substrate processing apparatus comprising:

• a gas supply unit configured to supply a gas into a substrate storage container, wherein the gas supply unit is installed in a loading port or a rotary pod shelf where the substrate storage container is placed, the gas supply unit comprising:
• a position sensor configured to detect whether the substrate storage container is placed on the loading port or the rotary pod shelf;
• a valve configured to supply the gas therethrough;
• and a detection unit configured to detect a flow rate of the gas supplied into the substrate storage container;
• a substrate storage container transfer device configured to transfer the substrate storage container between the loading port and the rotary pod shelf;
• a transfer controller configured to control the substrate storage container transfer device;
• a gas supply controller configured to compare the flow rate of the gas supplied into the substrate storage container via the gas supply unit to a preset reference value and to output a signal indicating a result of comparison between the flow rate of the gas and the preset reference value;
• and
• a controller configured to control a transfer state of the substrate storage container by controlling the substrate storage container transfer device via the transfer controller,
• wherein the controller is configured to manage a state of the gas in the substrate storage container based on the signal outputted from the gas supply controller, and
• the gas supply controller is configured to monitor the flow rate of the gas via the detection unit to determine whether the flow rate of the gas is equal to or higher than the preset reference value while the gas supply unit supplies the gas into the substrate storage container during a period from a loading of the substrate storage container onto the loading port to an unloading of the substrate storage container from the loading port out of the substrate processing apparatus,
• wherein the controller is configured to:
• receive instruction data, said instruction data including a carrier ID of the substrate storage container and a type of substrate accommodated in the substrate storage container and a purging schedule;
• based on said instruction data said controller is further configured to:
• instruct the transfer controller to start loading the substrate storage container,
• identify the substrate storage container based on the carrier ID included in the instruction data,
• determine whether the substrate storage container, which has arrived at the loading port, is identical to the substrate storage container instructed to be loaded, and
• control the gas supply controller to start purging the substrate storage container placed on the loading port.