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US 9,960,022 B2Granted
Sputtering target with optimized performance characteristics
AssigneeMaterion Advanced Materials Germany GmbH
InventorsCarl Christoph Stahr, Martin Schlott
Life of this patent
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Abstract
The invention relates to a sputtering target containing a sputtering material containing a metal oxide. The sputtering material contains zirconium and titanium as metals and contains at least one mixed oxide phase.
Claims9
A sputtering target comprising a sputtering material comprising a metal oxide, wherein the metal oxide comprises zirconium and titanium as a metal fraction, and contains at least 30 wt % of at least one mixed oxide phase, and wherein a fraction of zirconium in the metal fraction is 20 to 30 wt %.
A sputtering target comprising:
- a support structure;
- and
- a sputtering material deposited on the support structure;
- wherein the sputtering material comprises a metal oxide and at least 95 wt % of at least one mixed oxide phase;
- wherein the metal oxide comprises zirconium and titanium, and a fraction of zirconium in the metal oxide is 20 to 30 wt %.
2 more elements
Dependencies are inferred from the claim text.