System and method to detect substrate and/or substrate support misalignment using imaging

A method for correcting a misalignment of an object in a processing system, comprising:

• obtaining an image of a semiconductor processing object, wherein the image is obtained while the semiconductor processing object is rotating;
• determining values associated with pixels in at least one region of the image;
• detecting a misalignment of the semiconductor processing object based on the determined values, comprising:
• calculating at least one of:
• a center of gravity value of the pixels in the at least one region;
• or
• an average weight of the pixels in the at least one region;
• and
• detecting a misalignment of the semiconductor processing object based on at least one of:
• the calculated center of gravity;
• or
• the calculated average weight of the pixels in the at least one region;
• and
• comparing the determined values;
• and
• correcting the misalignment.

A method for correcting a misalignment of an object in a processing system, comprising:

• obtaining an image of a semiconductor processing object, wherein the image is obtained while the semiconductor processing object is rotating;
• determining values associated with pixels in at least one region of the image;
• detecting a position change of the semiconductor processing object based on the values by multiplying a center of gravity deviation value of the pixels in the at least one region by a weight of the pixels in the at least one region and comparing the determined values;
• and
• correcting a misalignment of the semiconductor processing object based on the position change.