Apparatus for post exposure bake
AssigneeApplied Materials, Inc.
InventorsKyle M. Hanson, Gregory J. Wilson, Viachslav Babayan
Life of this patent
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Abstract
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
Claims20
A substrate processing apparatus, comprising:
- a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally;
- a moveable door coupled to the chamber body;
- a first electrode coupled to the door and a seal coupled to the first electrode, wherein the seal is configured to contact a backside of a substrate when a frontside of the substrate is disposed adjacent to the process volume;
- a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume;
- a first plurality of fluid ports formed in a sidewall of the chamber body adjacent the process volume;
- and
- a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports.
A substrate processing apparatus, comprising:
- a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally;
- a moveable door coupled to the chamber body;
- a first electrode coupled to the door, the first electrode configured to support a substrate thereon;
- a first O-ring coupled to the first electrode, wherein the first O-ring is positioned to contact a backside of the substrate adjacent to an outer diameter of the substrate;
- a second O-ring coupled to the first electrode adjacent to an outer diameter of the first electrode, wherein the second O-ring contacts a surface of a sidewall of the chamber body;
- a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume;
- a first plurality of fluid ports formed in a sidewall of the chamber body adjacent the process volume;
- and
- a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports.
A substrate processing apparatus, comprising:
- a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally;
- a moveable door coupled to the chamber body;
- a first electrode coupled to the door, the first electrode configured to support a substrate thereon;
- a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume;
- a first O-ring coupled to the first electrode, wherein the first O-ring is positioned to contact a backside of the substrate;
- a second O-ring coupled to an outer diameter of the second electrode, wherein the second O-ring is positioned in contact with a sidewall of the chamber body;
- a first plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume;
- and
- a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports.
Dependencies are inferred from the claim text.