Cross-linkable fluorinated photopolymer
AssigneeOrthogonal, Inc.
InventorsCharles Warren Wright, Douglas Robert Robello, John Andrew DeFranco, Diane Carol Freeman, Frank Xavier Byrne
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Abstract
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.
Claims14
A photosensitive composition comprising:
- a fluorinated photo cross-linkable polymer comprising a first repeating unit having a fluorine-containing group but not a cinnamate group, a second repeating unit having a fluorine-containing cinnamate group and a third repeating unit having a dry-etch-resistant group, wherein the polymer has a total fluorine content in a range of 30 to 60% by weight;
- and
- a fluorinated solvent.
A device comprising a layer formed from a fluorinated photo cross-linkable polymer comprising a first repeating unit having a fluorine-containing group but not a cinnamate group, a second repeating unit having a fluorine-containing cinnamate group and a third repeating unit having a dry-etch-resistant group, wherein the polymer has a total fluorine content in a weight range of 30 to 60%.
Dependencies are inferred from the claim text.