Back to results
US 9,958,776 B2Granted
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Masaki Ohashi
Life of this patent
Estimating the term…
Abstract
A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
Claims20
A resist composition comprising a base polymer and a phosphazene salt compound having the formula (A):
- wherein R1 to R7 are each independently hydrogen, or a C1-C24 straight, branched or cyclic alkyl group, C2-C24 straight, branched or cyclic alkenyl group, C2-C24 straight, branched or cyclic alkynyl group, or C6-C20 aryl group, which may contain an ester, ether, sulfide, sulfoxide, carbonate, carbamate, sulfone, halogen, amino, amide, hydroxy, thiol or nitro moiety, a pair of R1 and R2, R2 and R3, R3 and R4, R4 and R5, R5 and R6, or R6 and R7 may bond together to form a ring, or a pair of R2 and R3, R4 and R5, or R6 and R7, taken together, may form a double bond or a group having the formula (A)-1, R1 may be a group having the formula (A)-2,
- wherein R8 to R17 are each independently hydrogen, or a C1-C24 straight, branched or cyclic alkyl group, C2-C24 straight, branched or cyclic alkenyl group, C2-C24 straight, branched or cyclic alkynyl group, or C6-C20 aryl group, a pair of R8 and R9, R9 and R10, R10 and R11, R11 and R12, R12 and R13, R14 and R15, or R16 and R17 may bond together to form a ring, or a pair of R8 and R9, R10 and R11, or R12 and R13, taken together, may form a double bond or a group having the formula (A)-1,
- A− is an anion selected from the group consisting of hydroxide, chloride, bromide, iodide, nitrate, nitrite, chlorate, chlorite, perchlorate, hydrogencarbonate, dihydrogenphosphate, hydrogensulfate, thiocyanate, hydrogenoxalate, cyanide, iodate ions, and anions of the formulae (M-1) and (M-2):
- wherein R18 is hydrogen, or a C1-C30 straight, branched or cyclic alkyl group, C2-C30 straight, branched or cyclic alkenyl group, C2-C30 straight, branched or cyclic alkynyl group, C6-C20 aryl group, C7-C20 aralkyl group, or C3-C20 aromatic or aliphatic heterocycle-containing group, which may contain an ester, ether, sulfide, sulfoxide, carbonate, carbamate, sulfone, halogen, amino, amide, hydroxy, thiol or nitro moiety, with the proviso that R18 does not contain a group of the formula (A)-3:
- wherein Ar is a C6-C16 aromatic group, R21 and R22 are each independently hydrogen, hydroxy, alkoxy, C1-C6 straight, branched or cyclic alkyl group, or C6-C10 aryl group, R19 is fluorine, or a C1-C10 straight, branched or cyclic fluoroalkyl group or fluorophenyl group, which may contain a hydroxy, ether, ester or alkoxy moiety, R20 is hydrogen, or a C1-C10 straight, branched or cyclic alkyl group, C2-C10 straight, branched or cyclic alkenyl group, C2-C10 straight or branched alkynyl group, or C6-C10 aryl group, which may contain a hydroxy, ether, ester or alkoxy moiety,
- wherein the carboxylate anion having formula (M-1) is selected from the group consisting of the following formulae:
3 more elements
A resist composition comprising a base polymer and a phosphazene salt compound having the formula (A):
- wherein R1 to R7 are each independently hydrogen, or a C1-C24 straight, branched or cyclic alkyl group, C2-C24 straight, branched or cyclic alkenyl group, C2-C24 straight, branched or cyclic alkynyl group, or C6-C20 aryl group, which may contain an ester, ether, sulfide, sulfoxide, carbonate, carbamate, sulfone, halogen, amino, amide, hydroxy, thiol or nitro moiety, a pair of R1 and R2, R2 and R3, R3 and R4, R4 and R5, R5 and R6, or R6 and R7 may bond together to form a ring, or a pair of R2 and R3, R4 and R5, or R6 and R7, taken together, may form a double bond or a group having the formula (A)-1, R1 may be a group having the formula (A)-2,
- wherein R8 to R17 are each independently hydrogen, or a C1-C24 straight, branched or cyclic alkyl group, C2-C24 straight, branched or cyclic alkenyl group, C2-C24 straight, branched or cyclic alkynyl group, or C6-C20 aryl group, a pair of R8 and R9, R9 and R10, R10 and R11, R11 and R12, R12 and R13, R14 and R15, or R16 and R17 may bond together to form a ring, or a pair of R8 and R9, R10 and R11, or R12 and R13, taken together, may form a double bond or a group having the formula (A)-1,
- A− is an anion selected from the group consisting of hydroxide, chloride, bromide, iodide, nitrate, nitrite, chlorate, chlorite, perchlorate, hydrogencarbonate, dihydrogenphosphate, hydrogensulfate, thiocyanate, hydrogenoxalate, cyanide, iodate ions, and anions of the formulae (M-1) and (M-2):
- wherein R18 is hydrogen, or a C1-C30 straight, branched or cyclic alkyl group, C2-C30 straight, branched or cyclic alkenyl group, C2-C30 straight, branched or cyclic alkynyl group, C6-C20 aryl group, or C7-C20 aralkyl group, which may contain an ester, ether, sulfide, sulfoxide, carbonate, carbamate, sulfone, halogen, amino, amide, hydroxy, thiol or nitro moiety, with the proviso that R18 does not contain a group of the formula (A)-3:
- wherein Ar is a C6-C16 aromatic group, R21 and R22 are each independently hydrogen, hydroxy, alkoxy, C1-C6 straight, branched or cyclic alkyl group, or C6-C10 aryl group, R19 is fluorine, or a C1-C10 straight, branched or cyclic fluoroalkyl group or fluorophenyl group, which may contain a hydroxy, ether, ester or alkoxy moiety, R20 is hydrogen, or a C1-C10 straight, branched or cyclic alkyl group, C2-C10 straight, branched or cyclic alkenyl group, C2-C10 straight or branched alkynyl group, or C6-C10 aryl group, which may contain a hydroxy, ether, ester or alkoxy moiety.
2 more elements
Dependencies are inferred from the claim text.