Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a compound (A) which generates an acid by irradiation with actinic rays or radiation;
• wherein the acid includes an aromatic ring, and the aromatic ring is substituted with two or more groups represented by the following general formula (M),
• wherein, in the formula (M),
• Y1 and Y2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group;
• Z represents a hydrogen atom or a substituent;
• and
• * represents a linking site with the aromatic ring.

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a compound (A) which generates an acid by irradiation with actinic rays or radiation, and a cross-linking agent (C) being a compound having two or more groups represented by the following general formula (M) in a molecule,
• wherein the acid includes an aromatic ring, and the aromatic ring is substituted with at least one group represented by the following general formula (M),
• wherein, in the formula (M),
• Y1 and Y2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group;
• Z represents a hydrogen atom or a substituent;
• and
• * represents a linking site with the aromatic ring.

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a compound (A) which generates an acid by irradiation with actinic rays or radiation, and a cross-linking agent (C) being a compound having two or more alkoxymethyl groups in a molecule,
• wherein the acid includes an aromatic ring, and the aromatic ring is substituted with at least one group represented by the following general formula (M),
• wherein, in the formula (M),
• Y1 and Y2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group;
• Z represents a hydrogen atom or a substituent;
• and
• * represents a linking site with the aromatic ring.

A compound represented by the following general formula (I):

• wherein, in the formula (I),
• M+ represents a sulfonium cation;
• X represents an alkyl group, a cycloalkyl group, an aryl group, a halogen atom, a hydroxyl group, an alkoxy group, or an acyl group;
• Z represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an acyl group;
• n represents an integer of 1 to 3;
• o represents an integer of 1 to 5;
• p represents an integer of 0 to 4;
• and
• o+p≤5 is satisfied.

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a compound (A) which generates an acid by irradiation with actinic rays or radiation,
• wherein the acid includes an aromatic heterocyclic structure, and the aromatic heterocyclic structure is linked with at least one group represented by the following general formula (M),
• wherein, in the formula (M),
• Y1 and Y2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group;
• Z represents a hydrogen atom or a substituent;
• and
• * represents a linking site with a residue of the aromatic heterocyclic structure.

A negative-tone pattern forming method comprising:

• forming a film using an actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid includes a structure represented by the following general formula (9);
• exposing the film;
• and developing the exposed film with a developer containing an organic solvent,
• wherein the actinic ray-sensitive or radiation-sensitive resin composition further comprises a compound (B1) having a phenolic hydroxyl group and a compound (B2) having a group which is capable of decomposing by the action of an acid,
• the compound (B1) having a phenolic hydroxyl group includes a polymer compound having at least one kind of repeating unit represented by the following general formula (1),
• wherein, in the formula (9),
• A represents a divalent linking group;
• B represents an aromatic ring;
• Y1 and Y2 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group;
• Z represents a hydrogen atom or a substituent;
• and
• o represents an integer of 1 to 5, and
• wherein, in the general formula (1),
• R11 represents a hydrogen atom, a methyl group which may have a substituent, or a halogen atom;
• B1 represents a single bond or a divalent linking group;
• Ar represents an aromatic ring;
• and
• m1 represents an integer of 1 or more.