Array substrate and manufacturing method thereof, and display device

A manufacturing method of an array substrate, comprising steps of:

• forming a pattern of a third common electrode on a base through a patterning process;
• forming a pattern of a gate, a gate line and a second common electrode en-above the base, on which the pattern of the third common electrode is formed, through a patterning process, so that the second common electrode is provided on the third common electrode;
• forming a pattern of a second insulation layer and a pattern of a third part of a third via located in the second insulation layer above the base, on which the pattern of the gate, the gate line and the second common electrode is formed, through a patterning process;
• forming a pattern of an active layer above the base, on which the pattern of the second insulation layer is formed, through a patterning process;
• forming a pattern of a source, a drain, a data line and a first common electrode and a pattern of a second part of the third via located in a source/drain metal layer above the base, on which the pattern of the active layer is formed, through a patterning process;
• forming a pattern of a first insulation layer, a pattern of a first part of the third via located in the first insulation layer and a pattern of a first via and a second via above the base, on which the pattern of the source and the drain are formed, through a patterning process;
• and
• forming a pattern of a conductive layer above the base, on which the pattern of the first insulation layer is formed, through a patterning process, so that the first common electrodes and the second common electrodes of two adjacent pixel units are electrically connected to each other by the conductive layer through the first via, the second via and the third via.