Green laser line notch absorber
AssigneeRockwell Collins, Inc.
InventorsRobert G. Brown, Steven E. Koenck, James E. Melzer, Wyatt L. Hendrick
Life of this patent
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Abstract
An optical notch filter includes a particle layer including nano-particles in a substrate material. The nano-particles are arranged in one or more arrays to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter. The filter exhibits a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +50° and −50°, and has a full width half maxima transmission of less than 15 nm.
Claims14
An optical notch filter, comprising:
- a particle layer including nano-particles in a substrate material,
- wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines, the filter exhibiting a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +50° and −50°, and having a full width half maxima transmission of less than 15 nm.
An optical notch filter, comprising:
- a particle layer including nano-particles in a substrate material,
- wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines,
- wherein the filter exhibits a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +60° and −60°, and has a full width half maxima transmission of less than 15 nm.
An optical notch filter, comprising:
- a particle layer including nano-particles in a substrate material,
- wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength in a visible region incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines, the filter exhibiting a radiation absorption profile with an absorption maxima of at least 99% at a wavelength in the visible region for an angle of incidence of between +50° and −50°, and having a full width half maxima transmission of less than 15 nm.
Dependencies are inferred from the claim text.