Apparatus for selectively transmitting the spectrum of electromagnetic radiation within a predefined wavelength range

Apparatus for selectively transmitting a spectrum of electromagnetic radiation between a lower limit wavelength and an upper limit wavelength, comprising:

• a carrier,
• a pinhole diaphragm arranged above the carrier and made of a material substantially impermeable to a radiation of interest, the pinhole diaphragm having at least one radiation passage opening with a width for allowing the passage of radiation of a wavelength less than or equal to the upper limit wavelength, the width of each of the at least one radiation passage opening being equal to a quarter or less than a quarter of the upper limit wavelength,
• an electrically insulating and optically transparent dielectric layer formed on the carrier inside the at least one radiation passage opening and extending, in a manner adjoining the radiation passage opening, between the carrier and at least one section below the pinhole diaphragm,
• the pinhole diaphragm comprising a first aperture mask and a second aperture mask, wherein:
• the first aperture mask is formed on the dielectric layer, wherein the first aperture mask is in a first plane above the carrier,
• the first aperture mask comprising first aperture mask windows having a first window spacing, each first aperture mask window comprising a first edge, wherein each first edge of the first aperture mask window is beveled in a first direction,
• the second aperture mask is formed on an intermediate dielectric layer, wherein the second aperture mask is in a second plane above the carrier different from the first plane, and the intermediate dielectric layer is made of an electrically insulating and optically permeable dielectric material,
• the second aperture mask comprising second aperture mask windows having a second window spacing different from the first window spacing of the first aperture mask, each second aperture mask window comprising a first edge, wherein the first edge of each second aperture mask window is beveled in a second direction, opposite the first direction,
• the first aperture mask windows and the second aperture mask windows overlap to form respective radiation passage openings of different sizes, wherein each radiation passage opening comprises the first edge of a first aperture mask window on the first plane and the first edge of a second aperture mask window on the second plane,
• wherein, between the second aperture mask and the carrier, the overall thickness of a double layer comprising the dielectric layer and the intermediate dielectric layer is less than or equal to a half to a quarter of the lower limit wavelength and
• wherein the first edge of the first aperture mask window and the first edge of the second aperture path window are configured to dampen resonance paths as a result of an obliquely directed propagation of the radiation after passage through the respective radiation passage opening and for at least minimizing a resonance between the aperture masks and the upper side of the carrier facing the aperture masks by scattering the radiation.