Method for measuring level of material level measuring apparatus
AssigneeFinetek Co., Ltd.
InventorsLiang-Chi Chang, Chun-Han Huang, I-Chu Lin
Life of this patent
Estimating the term…
Loading patent…
AssigneeFinetek Co., Ltd.
InventorsLiang-Chi Chang, Chun-Han Huang, I-Chu Lin
Estimating the term…
A probe (14) of a material level measuring apparatus (10) inserts into a container (20). The material level measuring apparatus (10) transmits an electromagnetic wave signal. When the electromagnetic wave signal touches a surface of a material (30), a first reflected signal is generated. When the electromagnetic wave signal touches a bottom of the probe (14), a second reflected signal is generated. According to the first reflected signal and the second reflected signal, a first time-passing difference value (t1) and a second time-passing difference value (t2) are obtained. According to the first time-passing difference value (t1), the second time-passing difference value (t2) and a predetermined empty container time-passing difference value (t3), a first material level and a second material level are obtained. According to the first material level and the second material level, a third material level is obtained.
A method for measuring a level of a material (30) by a material level measuring apparatus (10), the method comprising:
Dependencies are inferred from the claim text.