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US 9,957,809 B2Granted
Modified interface around a hole
AssigneeSiemens Aktiengesellschaft
InventorsChristian Amann, Thomas Beck, Björn Beckmann, Andreas Böttcher, Winfried Esser, Giuseppe Gaio, Rudolf Küperkoch, Eckart Schumann, Rostislav Teteruk
Life of this patent
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Abstract
A layer system including a substrate and a layer is provided. The layer system has a hole at least in the layer, and wherein at least one recess is present in a surface of the layer in a vicinity around the hole or directly adjoining a boundary line of the hole.
Claims13
A layer system comprising:
- a substrate, and
- a layer,
- wherein the layer system comprises a hole at least in the layer,
- wherein the hole comprises a diffuser on a surface of the layer,
- wherein at least one recess is present in the surface of the layer in a vicinity around the hole or directly adjoining a boundary line of the hole, and
- wherein the at least one recess comprises:
- a discrete, continuous closed recess that fully encircles the hole, or
- plural discrete, continuous V-shaped or L-shaped recesses.
5 more elements
A layer system comprising:
- a substrate,
- a layer disposed on the substrate,
- a film cooling hole through the substrate and the layer;
- and
- a plurality of punctiform or dashed recesses that form a circle or oval in a surface of the layer around the film cooling hole.
2 more elements
A layer system comprising:
- a substrate,
- a layer on the substrate, the layer comprising a surface,
- a diffuser disposed in the surface and defining a perimeter in the surface, the perimeter comprising corners,
- a hole in the layer that opens into the diffuser, and
- plural discrete recesses in the surface of the layer around the hole,
- wherein each recess of the plural discrete recesses forms a continuous shape comprising two sides and a vertex and each recess being in a different respective location, wherein the vertex of each recess is oriented toward a corner of the perimeter.
3 more elements
Dependencies are inferred from the claim text.