Back to results
US 9,957,614 B2Granted
Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same
AssigneeUp Chemical Co., Ltd.
InventorsWon Seok Han, So Young Kim, Wonyong Koh
Life of this patent
Estimating the term…
Abstract
The present disclosure relates to a novel ruthenium compound, a method for preparing the ruthenium compound, a precursor composition for depositing a ruthenium-containing film including the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition.
Claims12
A ruthenium compound, represented by the following Chemical Formula 1:
- wherein in the above Chemical Formula 1,
- each of R1 to R4 independently is H, or a member selected from the group consisting of:
- methyl group;
- ethyl group;
- iso-propyl group;
- and, tert-butyl group;
- and
- n is an integer of from 0 to 3.
5 more elements
Dependencies are inferred from the claim text.