High-frequency wave supplying structure

A high-frequency wave supplying structure employed in a film forming apparatus that performs, in a single chamber, a process of forming a metal film on a workpiece and a process using a high-frequency wave on a workpiece, the structure comprising:

• a center conductor that extends in a specified direction and to which a high-frequency wave is supplied;
• an outer conductor that is located outward of the center conductor, coaxial with the center conductor, and grounded;
• and
• a cylindrical insulating member that is provided between the center conductor and the outer conductor, wherein
• the center conductor includes a distal end that protrudes in the specified direction from an opening of the outer conductor,
• the distal end of the center conductor is a support portion that supports the workpiece,
• a tubular shield member is arranged outward of the outer conductor to be coaxial with the outer conductor and the center conductor,
• the shield member includes a distal end that is located at an end in a vicinity of the support portion in the specified direction,
• the outer conductor includes a distal end that is located at an end in a vicinity of the support portion in the specified direction,
• the distal end of the shield member is closer to the support portion in the specified direction than the distal end of the outer conductor,
• the insulating member includes a protruding portion that protrudes in the specified direction toward the support portion from the opening of the outer conductor, and
• at least one of the protruding portion and the shield member is opposed to the distal end of the outer conductor in the specified direction.