Composition for forming silica layer, method for manufacturing silica layer, and silica layer

A composition for forming a silica layer, the composition comprising

• a silicon-containing polymer including a SiH3 moiety, and
• a solvent,
• wherein the silicon-containing polymer has a total sum of Si—H integral values in a 1H-NMR spectrum of less than or equal to about 12,
• the total sum of Si—H integral values is calculated through the following acts S1 and S2 provided in Condition 1:
• [Condition 1]
• S1) a Sample 1 having a solid content of about 15±0.1 wt % is prepared by adding the silicon-containing polymer to dibutylether (DBE) and then diluting it by 20% by volume with a CDCl3 (Chloroform-d) solvent, thereby preparing a Sample 2, and
• S2) 1H-NMR spectrum of the Sample 2 is measured at 300 MHz to calculate integral values of Si—H1, Si—H2, and Si—H3 according to the following method, the calculation is repeated three times, these three measurements are averaged, and this average is regarded as a total sum of the Si—H integral values,
• wherein a method of calculating the sum of the integral values of the Si—H1, Si—H2, and Si—H3 is as follows:
• assuming that the dibutylether has an integral value of 40, integral values of a peak (peak B) corresponding to Si—H1 and Si—H2 present in the silicon-containing polymer and a peak (peak C) corresponding to Si—H3 are respectively calculated, and
• the peaks B and C are summed, and the sum is regarded as the sum of the integral values of Si—H1, Si—H2, and Si—H3;
• and
• the SiH3 moiety is included in an amount of about 15 to about 35 wt % based on a total amount of Si—H.