Method for manufacturing a device comprising a hermetically sealed vacuum housing and getter
AssigneeUlis
InventorsJérôme Favier, David Bunel
Life of this patent
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Abstract
A method of manufacturing a device having a microelectronic component housed in a hermetically sealed vacuum housing, including forming a getter in said housing, pumping out and heating the device to degas elements housed in said housing, after said pumping, hermetically sealing the housing in fluxless fashion. Further, each material forming the device likely to degas into the inner space is a mineral material, the getter is capable of substantially trapping hydrogen only and is inert to oxygen and/or to nitrogen and the heating and the sealing are performed at a temperature lower than 300° C.
Claims6
A method of manufacturing a device comprising a microelectronic component housed in a housing formed of walls defining a hermetically sealed vacuum inner space, comprising:
- forming a getter in a form of thin films capable of trapping gas in said inner space;
- pumping from said inner space;
- during said pumping, heating the device to degas the elements housed in said inner space;
- and
- after said pumping, hermetically sealing the housing in fluxless fashion;
- wherein each constituent of the device likely to degas into the inner space is a mineral material;
- wherein the getter is capable of substantially trapping hydrogen only and is inert to oxygen and/or nitrogen;
- and
- wherein the heating of the device and the sealing of the housing are carried out at a temperature lower than 300° C.
Dependencies are inferred from the claim text.