Substrate treating apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorYukihiko Inagaki
Life of this patent
Estimating the term…
Abstract
A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.
Claims17
A substrate treating apparatus comprising:
- an indexer section;
- a treating section;
- and
- a controller;
- the treating section including:
- a front heat-treating block;
- a front relay block;
- a solution treating block;
- a rear relay block;
- and
- a rear heat-treating block;
- the front heat-treating block including:
- heat-treating units configured to heat-treat substrates;
- and
- main transport mechanisms configured to transport the substrates to the heat-treating units of the front heat-treating block;
- the front relay block including:
- receivers configured to receive the substrates;
- and
- transport mechanisms configured to transport the substrates to the receivers of the front relay block;
- the solution treating block including:
- solution treating units configured to perform solution treatment of the substrates;
- and
- transport mechanisms for solution treatment configured to transport the substrates to the solution treating units;
- the rear relay block including:
- receivers configured to receive the substrates;
- and
- transport mechanisms configured to transport the substrates to the receivers of the rear relay block;
- the rear heat-treating block including:
- heat-treating units configured to heat-treat the substrates;
- and
- main transport mechanisms configures to transport the substrates to the heat-treating units of the rear heat-treating block;
- wherein
- the indexer section and the treating section are connected to be able to transport the substrates reciprocally;
- the front heat-treating block and the front relay block are connected to be able to transport the substrates reciprocally;
- the front relay block and the solution treating block are connected to be able to transport the substrates reciprocally;
- the front relay block is disposed between the solution treating block and the front heat-treating block;
- the solution treating block a rear relay block are connected to be able to transport the substrates reciprocally;
- the rear relay block and the rear heat-treating block are connected to be able to transport the substrates reciprocally;
- the rear relay block disposed between the solution treating block and the rear heat-treating block;
- and
- the controller controls operation of the main transport mechanisms of the front heat-treating block, the transport mechanisms of the front relay block, the transport mechanisms of the solution treating block, the transport mechanisms of the rear relay block and the main transport mechanisms of the rear heat-treating block.
A substrate treating apparatus comprising:
- an indexer section;
- a treating section;
- and
- a controller;
- the treating section including:
- a front heat-treating block;
- a front relay block;
- and
- a solution treating block;
- the front heat-treating block including:
- heat-treating units configured to heat-treat substrates;
- and
- main transport mechanisms configured to transport the substrates to the heat-treating units of the front heat-treating block;
- the front relay block including:
- receivers configured to receive the substrates;
- and
- transport mechanisms configured to transport the substrates to the receivers of the front relay block;
- the solution treating block including:
- solution treating units configured to perform solution treatment of the substrates;
- and
- transport mechanisms for solution treatment configured to transport the substrates to the solution treating units;
- wherein
- the indexer section and the treating section are connected to be able to transport the substrates reciprocally;
- the front heat-treating block and the front relay block are connected to be able to transport the substrates reciprocally;
- the front relay block and the solution treating block are connected to be able to transport the substrates reciprocally;
- the front relay block is disposed between the solution treating block and the front heat-treating block;
- the controller controls operation of the main transport mechanisms of the front heat-treating block, the transport mechanisms of the front relay block and the transport mechanisms of the solution treating block;
- the plurality of receivers of the front relay block are arranged in an up-down direction;
- the plurality of transport mechanisms of the front relay block are arranged laterally of the receivers of the front relay block;
- the plurality of transport mechanisms for solution treatment are arranged in the up-down direction;
- and
- the receivers of the front relay block are arranged so that each of the transport mechanisms for solution treatment is opposed to at least one of the receivers of the front relay block.
Dependencies are inferred from the claim text.